CSET2024极紫外光刻EUV技术的兴起及其对未来新兴技术的启示示研究报告英文版47页

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CSET2024极紫外光刻EUV技术的兴起及其对未来新兴技术的启示示研究报告英文版47页
CSET2024极紫外光刻EUV技术的兴起及其对未来新兴技术的启示示研究报告英文版47页
CSET2024极紫外光刻EUV技术的兴起及其对未来新兴技术的启示示研究报告英文版47页
CSET2024极紫外光刻EUV技术的兴起及其对未来新兴技术的启示示研究报告英文版47页
CSET2024极紫外光刻EUV技术的兴起及其对未来新兴技术的启示示研究报告英文版47页
摘要:

Policy BriefJuly 2024Tracing the Emergence of Extreme Ultraviolet LithographyLessons for Identifying, Protecting, and Promoting the Next Emerging TechnologyAuthor John VerWeyCenter for Security and Emerging Technology | 1 Executive Summary This paper presents a case study on the most important technology to have emerged in the past decade: extreme ultraviolet (EUV) lithography. In 2019, when the first commercial electronics enabled by EUV were released, the technology was hailed as “the machine that saved Moore’s Law.”1 All of today’s most advanced artificial intelligence (AI) chips, smartphones, autonomous driving systems, and high-performance computers contain semiconductors fabricated using EUV lithography. The Dutch company ASML has emerged as the sole supplier of EUV machines, winning a 30-year race that granted the company a monopoly on selling the tool essential for fabricating leading-edge semiconductors.2 However, while ASML gets well-deserved praise for developing and commerc

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